List Method of forming aligned pattern in pattern formation region by using imprint process Authors Sunghoon Lee, Dongouk Kim, Joonyong Park, Jihyun Bae, Bongsu Shin, Jaeseung Chung, Sukgyu Hahm, Jong G. Ok, Ilwun Yoon Country US Application# (Date) US 2016/0023399 (May 29, 2015) Registration# (Date) US 9855703 (Jan 2, 2018) Category Patents Link https://patents.google.com/patent/US9855703B2
