List Method of forming aligned pattern in pattern formation region by using imprint process Authors Sunghoon Lee, Dongouk Kim, Joonyong Park, Jihyun Bae, Bongsu Shin, Jaeseung Chung, Sukgyu Hahm, Jong G. Ok, Ilwun Yoon Country US patent Application# (Date) granted; US 9855703 B2 Category Patents Link https://patents.google.com/patent/US9855703B2 granted on Jan 2, 2018.
